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Proceedings Paper

Improve scanner matching using automated real-time feedback control via scanner match maker (SMM)
Author(s): Shian-Huan (Cooper) Chiu; Sheng-Hsiung Yu; Min-Hin Tung; Lei-Ken Wu; Ya-Tsz Yeh; James Manka; Chao-Tien (Healthy) Huang; John Robinson; Chin-Chou (Kevin) Huang; David Tien; YuYu Chen; Katsushi Makino; Jium-Ming Lin
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Paper Abstract

Traditional "matching matrix" methods for characterizing scanner matching assume that the scanner distortion performance is static. The latest scanner models can adjust the distortion performance dynamically, at run-time. The Scanner Match Maker (SMM) system facilitates calculation and application of these run-time adjustments, improving effective overlay performance of the scanner fleet, allowing more flexibility for mix-and-match exposure. The overlay |mean|+3s performance was improved significantly for a layer pair that is currently allowed mix-and-match pairing.

Paper Details

Date Published: 23 March 2009
PDF: 6 pages
Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72723E (23 March 2009); doi: 10.1117/12.814186
Show Author Affiliations
Shian-Huan (Cooper) Chiu, Rexchip Electronics Corp. (Taiwan)
Sheng-Hsiung Yu, Rexchip Electronics Corp. (Taiwan)
Min-Hin Tung, Rexchip Electronics Corp. (Taiwan)
Chung-Hua Univ. (Taiwan)
Lei-Ken Wu, Rexchip Electronics Corp. (Taiwan)
Ya-Tsz Yeh, Rexchip Electronics Corp. (Taiwan)
James Manka, KLA-Tencor Corp. (United States)
Chao-Tien (Healthy) Huang, KLA-Tencor Corp. (United States)
John Robinson, KLA-Tencor Corp. (United States)
Chin-Chou (Kevin) Huang, KLA-Tencor Corp. (United States)
David Tien, KLA-Tencor Corp. (United States)
YuYu Chen, Nikon Precision Tawian Ltd. (Taiwan)
Katsushi Makino, Nikon Corp. (Japan)
Jium-Ming Lin, Chung-Hua Univ. (Taiwan)


Published in SPIE Proceedings Vol. 7272:
Metrology, Inspection, and Process Control for Microlithography XXIII
John A. Allgair; Christopher J. Raymond, Editor(s)

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