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Proceedings Paper

Imaging budgets for EUV optics: ready for 22-nm node and beyond
Author(s): Marc Bienert; Aksel Göhnemeier; Oliver Natt; Martin Lowisch; Paul Gräupner; Tilmann Heil; Reiner B. Garreis; Koen van Ingen Schenau; Steve Hansen
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Paper Abstract

We derive an imaging budget from the performance of EUV optics with NA = 0.32, and demonstrate that the 22nm node requirements are met. Based on aerial image simulations, we analyze the impact of all relevant contributors, ranging from conventional quantities, like straylight or aberrations, to EUV-specific topics, namely influence of 3D mask effects and facetted illumination pupils. As test structures we consider dense to isolated lines, contact holes, and 2D elbows. We classify the contributions in a hierarchical order according to their weight in the CDU budget and identify the main drivers. The underlying physical mechanisms causing different contributions to be critical or less significant are clarified. Finally, we give an outlook for the 16nm and 11nm nodes. Future developments in optics manufacturing will keep the budgets controlled, thereby paving the way to enable printing of these upcoming nodes.

Paper Details

Date Published: 17 March 2009
PDF: 12 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 72711B (17 March 2009); doi: 10.1117/12.814185
Show Author Affiliations
Marc Bienert, Carl Zeiss SMT AG (Germany)
Aksel Göhnemeier, Carl Zeiss SMT AG (Germany)
Oliver Natt, Carl Zeiss SMT AG (Germany)
Martin Lowisch, Carl Zeiss SMT AG (Germany)
Paul Gräupner, Carl Zeiss SMT AG (Germany)
Tilmann Heil, Carl Zeiss SMT AG (Germany)
Reiner B. Garreis, Carl Zeiss SMT AG (Germany)
Koen van Ingen Schenau, ASML Netherlands B.V. (Netherlands)
Steve Hansen, ASML (United States)

Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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