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Proceedings Paper

Evaluation of the CD-SEM Vistec LWM90xx for line-width measurement of nanoimprint templates
Author(s): Marcus Pritschow; Joerg Butschke; Mathias Irmscher; Lidia Parisoli; Toshihide Oba; Toshimichi Iwai; Takayuki Nakamura
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Paper Abstract

In the UV-NIL template fabrication sequence usually four 65×65mm2 templates are fabricated at once using a 6025 mask blank. After finishing all patterning processes and the etching of the imprint pedestals the templates are separated by dicing and polishing. This technique offers the advantage to use standard mask tools for the majority of the production steps. In order to check the imprint pattern on the mask CD measurements of quartz features are necessary. To control the fabrication process more effectively the additional measurement of resist features would be helpful. When the template is used for imprinting, repeated cycles of anti-adhesion layer deposition and cleaning after multiple imprints might change the CD of the quartz features. The metrology steps have to be performed on 1X features and are therefore more challenging, compared to those for 4X photomasks. For this purpose we evaluated the capability of Vistec's CDSEM LWM90xx for line-width measurements of nanoimprint templates. After optimization of hardware and software settings, the measurement capability for different feature sizes has been characterized. Finally, the evaluated results have been compared with the ITRS requirements for the 22nm node in order to address possible future needs.

Paper Details

Date Published: 18 March 2009
PDF: 11 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 72711U (18 March 2009); doi: 10.1117/12.814161
Show Author Affiliations
Marcus Pritschow, Institut für Mikroelektronik Stuttgart (Germany)
Joerg Butschke, Institut für Mikroelektronik Stuttgart (Germany)
Mathias Irmscher, Institut für Mikroelektronik Stuttgart (Germany)
Lidia Parisoli, KLA-Tencor (Germany)
Toshihide Oba, Advantest Corp. (Japan)
Toshimichi Iwai, Advantest Corp. (Japan)
Takayuki Nakamura, Advantest Corp. (Japan)


Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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