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Proceedings Paper

Soft stamp UV-nanoimprint lithography for fabrication of laser diodes
Author(s): Jukka Viheriälä; Milla-Riina Viljanen; Juha Kontio; Tomi Leinonen; Juha Tommila; Michail Dumitrescu; Tapio Niemi; Markus Pessa
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Paper Abstract

In this paper, we investigate a novel nanofabrication process called soft UV nanoimprint lithography, for nanopatterning of compound semiconductors. We use flexible stamps with three layers and analyze their performance with wafers composed of III-V semiconductors. The developed stamp configuration is in many ways advantageous for the fabrication of precise gratings for various applications in photonics. We describe how to handle the deformation in both lateral and vertical directions by tuning the softness of the stamp and using a two step imprint process. As an application of the UV-NIL, we demonstrate a fabrication process for a laterally corrugated distributed feedback laser. Our laser fabrication process is free from regrowth and therefore easily adaptable to various material compositions and emission wavelengths. Due to the cost effective full wafer NIL, these lasers are attractive in various applications where low cost, single-mode laser diodes are required. Our development work improves the design freedom of the NIL fabrication process of the laser diodes, and improves the quality of the transferred patterns. To the best of our knowledge, this is the first demonstration of a single-mode laser diode fabricated by soft UV-NIL.

Paper Details

Date Published: 17 March 2009
PDF: 10 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 72711O (17 March 2009); doi: 10.1117/12.814122
Show Author Affiliations
Jukka Viheriälä, Tampere Univ. of Technology (Finland)
Milla-Riina Viljanen, Tampere Univ. of Technology (Finland)
Juha Kontio, Tampere Univ. of Technology (Finland)
Tomi Leinonen, Tampere Univ. of Technology (Finland)
Juha Tommila, Tampere Univ. of Technology (Finland)
Michail Dumitrescu, Tampere Univ. of Technology (Finland)
Tapio Niemi, Tampere Univ. of Technology (Finland)
Markus Pessa, Tampere Univ. of Technology (Finland)

Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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