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Proceedings Paper

Coulomb blur advantage of a multi-shaped beam lithography approach
Author(s): Matthias Slodowski; Hans-Joachim Doering; Thomas Elster; Ines A. Stolberg
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Paper Abstract

This paper describes a new multi beam approach in electron beam lithography called Multi Shaped Beam (MSB). Based on the well known Variable Shaped Beam (VSB) principle, the single shaped beam arrangement is extended and complemented by an array of individually controlled shaped beams. The positive effect of the MSB approach on resolution limiting stochastic beam blur due to Coulomb interactions will be highlighted applying detailed electron-optical Monte-Carlo simulations. To verify the feasibility of the above-mentioned new approach, there is also depicted a proof-of-lithography test stand based on a complete e-beam-lithography system containing MSB-specific hardware and software components.

Paper Details

Date Published: 17 March 2009
PDF: 9 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 72710Q (17 March 2009); doi: 10.1117/12.814113
Show Author Affiliations
Matthias Slodowski, Vistec Electron Beam GmbH (Germany)
Hans-Joachim Doering, Vistec Electron Beam GmbH (Germany)
Thomas Elster, Vistec Electron Beam GmbH (Germany)
Ines A. Stolberg, Vistec Electron Beam GmbH (Germany)

Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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