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Proceedings Paper

Dense lines created by spacer DPT scheme: process control by local dose adjustment using advanced scanner control
Author(s): Jo Finders; Mircea Dusa; Bert Vleeming; Timon Fliervoet; Birgitt Hepp; Henry Megens; Remco Groenendijk; John Quaedackers; Evert Mos; Christian Leewis; Frank Bornebroek; Mireille Maenhoudt; Marc Leblans; Tom Vandeweyer; Gayle Murdoch; Efrain Altamirano Sanchez
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Paper Abstract

In this paper we present a methodology to investigate and optimize the CD balance between the four features of a final 32nm lines and space pattern created by spacer pitch doubling. Metrology (SEM and scatterometry) was optimized to measure and separate the two lines and the two spaces of the 32nm features. In case a space unbalance emerged during the various processing steps such as etch and deposition, this was compensated by calculating and feed-back local dose offsets to the scanner. For the spacer process used in this study we observe 20..40% improvement in space CDU and space balance, when applying the dose corrections.

Paper Details

Date Published: 17 March 2009
PDF: 11 pages
Proc. SPIE 7274, Optical Microlithography XXII, 72740R (17 March 2009); doi: 10.1117/12.814091
Show Author Affiliations
Jo Finders, ASML (Netherlands)
Mircea Dusa, ASML US, Inc. (United States)
Bert Vleeming, ASML (Netherlands)
Timon Fliervoet, ASML (Netherlands)
Birgitt Hepp, ASML (Netherlands)
Henry Megens, ASML (Netherlands)
Remco Groenendijk, ASML (Netherlands)
John Quaedackers, ASML (Netherlands)
Evert Mos, ASML (Netherlands)
Christian Leewis, ASML (Netherlands)
Frank Bornebroek, ASML (Netherlands)
Mireille Maenhoudt, IMEC vzw (Belgium)
Marc Leblans, IMEC vzw (Belgium)
Tom Vandeweyer, IMEC vzw (Belgium)
Gayle Murdoch, IMEC vzw (Belgium)
Efrain Altamirano Sanchez, IMEC vzw (Belgium)


Published in SPIE Proceedings Vol. 7274:
Optical Microlithography XXII
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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