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Proceedings Paper

Optimal setting strategy for kernel-based OPC simulation engines
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Paper Abstract

We have studied the parameter setting dependence on the OPC TAT and OPC accuracy. We have found that we can save OPC TAT with sufficient accuracy by optimizing the optical diameter, fringe length, and the kernel counts in optical simulations of OPC. The optical diameter should be set to the optimal value depending on its mask design regularity. In the kernel-based optical simulations, the residual error is found to drop suddenly at the critical kernel count. This critical kernel count is found to be almost independent of the optical diameter, aberrations, and resist stack structures. On the other hand, it is clarified that the critical kernel count is strongly correlated with the coherence factor of the illuminations. Using this critical kernel count, we can obtain the image intensities with sufficient accuracy. We propose a method to determine fringe length by analyzing the characteristics of the optical kernels that are independent of the mask layouts.

Paper Details

Date Published: 16 March 2009
PDF: 9 pages
Proc. SPIE 7274, Optical Microlithography XXII, 727410 (16 March 2009); doi: 10.1117/12.814049
Show Author Affiliations
Katsuyoshi Kodera, Toshiba Corp. Semiconductor Co. (Japan)
Satoshi Tanaka, Toshiba Corp. Semiconductor Co. (Japan)
Toshiya Kotani, Toshiba Corp. Semiconductor Co. (Japan)
Soichi Inoue, Toshiba Corp. Semiconductor Co. (Japan)


Published in SPIE Proceedings Vol. 7274:
Optical Microlithography XXII
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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