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Proceedings Paper

EUVL system: moving towards production
Author(s): Hans Meiling; Nico Buzing; Kevin Cummings; Noreen Harned; Bas Hultermans; Roel de Jonge; Bart Kessels; Peter Kürz; Sjoerd Lok; Martin Lowisch; Joerg Mallman; Bill Pierson; Christian Wagner; Andre van Dijk; Eelco van Setten; John Zimmerman
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Paper Abstract

Single exposure lithography is the most cost effective means of achieving critical level exposures, and extreme ultraviolet lithography (EUVL) is the technology that will enable this for 27nm production and below. ASML is actively engaged in the development of a multi generation production EUVL system platform that builds on TWINSCANTM technology and the designs and experience gained from the build, maintenance, and use of the Alpha Demo Tools (ADTs). The ADTs are full field step-and-scan exposure systems for EUVL and are being used at two research centers for EUVL process development by more than 10 of the major semiconductor chip makers, along with all major suppliers of masks and resist. In this paper, we will present our EUVL roadmap, and the manufacturing status of the projection lens for our first production system. Included will also be some test data on the new reticle pods. Experimental results from ADT showing the progress in imaging (28 nm half pitch 1:1 lines/spaces CDU ~10%), single machine overlay down to 3 nm, and resist complete the paper.

Paper Details

Date Published: 17 March 2009
PDF: 15 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 727102 (17 March 2009); doi: 10.1117/12.814041
Show Author Affiliations
Hans Meiling, ASML Netherlands B.V. (Netherlands)
Nico Buzing, ASML Netherlands B.V. (Netherlands)
Kevin Cummings, ASML (United States)
Noreen Harned, ASML (United States)
Bas Hultermans, ASML Netherlands B.V. (Netherlands)
Roel de Jonge, ASML Netherlands B.V. (Netherlands)
Bart Kessels, ASML (United States)
Peter Kürz, Carl Zeiss SMT AG (Germany)
Sjoerd Lok, ASML Netherlands B.V. (Netherlands)
Martin Lowisch, Carl Zeiss SMT AG (Germany)
Joerg Mallman, ASML Netherlands B.V. (United States)
Bill Pierson, ASML (United States)
Christian Wagner, ASML Netherlands B.V. (Netherlands)
Andre van Dijk, ASML Netherlands B.V. (Netherlands)
Eelco van Setten, ASML Netherlands B.V. (Netherlands)
John Zimmerman, ASML (United States)


Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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