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Proceedings Paper

Plasmonic nanolithography for sub-100-nm patterning using array ridge apertures
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Proc. SPIE 7271, Alternative Lithographic Technologies, 72712V; doi: 10.1117/12.814006
Show Author Affiliations
Yongwoo Kim, Yonsei Univ. (Korea, Republic of)
Seok Kim, Yonsei Univ. (Korea, Republic of)
Howon Jung, Yonsei Univ. (Korea, Republic of)
Sinjeung Park, Yonsei Univ. (Korea, Republic of)
Eungman Lee, Yonsei Univ. (Korea, Republic of)
Jae W. Hahn, Yonsei Univ. (Korea, Republic of)


Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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