Share Email Print

Proceedings Paper

Split, overlap/stitching, and process design for double patterning considering local reflectivity variation by using rigorous 3D wafer-topography/lithography simulation
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Double patterning (DP) was investigated for logic layout by using rigorous 3D wafer-topography/ lithography simulator with water immersion lithography. With increasing complexity of DP process, 3D wafer-topography effect of stack structure must be considered, because of its impact to lithography. The main purpose of this paper is to present how to optimize both process and design to ensure overlap and connectivity of split pattern, by solving electro-magnetic field distribution in wafer substrate as well as resist region. Process window was analyzed varying not only focus, dose and split masking layers, but also considering topography of substrate stack structures, which cause local reflectivity variations. Arbitrary 45nm logic layout including L-shape pattern was analyzed. Process window of second Litho step was analyzed. Due to reflection from Hard Mask, HM (the first Litho step) the process window was restricted and became smaller. The other option, swapping first and second Litho masks is a better choice with respect to impact of wafer topography. The optimization of stack process condition was analyzed by using contour plot of reflectivity, as functions of n, k and thickness of materials inside BARC. The concept of Extended NILS considering local reflectivity variation from wafer process is able to explain the variation of resist sidewall slope and Exposure Latitude. Therefore, it is useful to analyze connectivity at stitching point by using 3D wafer-topography/ lithography simulator and to optimize the combination of DP process and layout stitching design. Furthermore as design of advanced process, LLE (Litho-Litho-Etch), with resist freezing was simulated.

Paper Details

Date Published: 16 March 2009
PDF: 12 pages
Proc. SPIE 7274, Optical Microlithography XXII, 72740H (16 March 2009); doi: 10.1117/12.813976
Show Author Affiliations
Itaru Kamohara, Synopsys Japan (Japan)
Thomas Schmoeller, Synopsys GmbH (Germany)

Published in SPIE Proceedings Vol. 7274:
Optical Microlithography XXII
Harry J. Levinson; Mircea V. Dusa, Editor(s)

© SPIE. Terms of Use
Back to Top