Share Email Print
cover

Proceedings Paper

Characteristics and issues of an EUVL mask applying phase-shifting thinner absorber for device fabrication
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Phase-shifting EUVL masks applying thinner absorber are investigated to design optimum mask structure with less shadowing problems. Simulations using S-Litho show that H-V bias in Si capping structure is higher than that of Ru capping since the high n (= 0.999) of Si increases sensible absorber height. Phase differences obtained from the patterned masks using the EUV CSM are well-matched with the calculated values using the practical refractive index of absorber materials. Although the mask with 62.4-nm-thick absorber, among the in-house masks, shows the closest phase ΔΦ(= 176°) to the out-of-phase condition, higher NILS and contrast as well as lower H-V bias are obtained with 52.4-nm-thick absorber (ΔΦ = 151°) which has higher R/R0 ratio. MET results also show that lithography performances including MEEF, PW, and resist threshold (dose), are improved with thinner absorber structure. However, low OD in EUVL mask, especially in thinner absorber structure, results in light leakage from the neighboring exposure shots, and thus an appropriate light-shielding layer should be introduced.

Paper Details

Date Published: 17 March 2009
PDF: 10 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 72710D (17 March 2009); doi: 10.1117/12.813932
Show Author Affiliations
Hwan-Seok Seo, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Dong-Gun Lee, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Byung-Sup Ahn, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Hakseung Han, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Sungmin Huh, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
In-Yong Kang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Hoon Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Dongwan Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Seong-Sue Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Han-Ku Cho, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)


Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

© SPIE. Terms of Use
Back to Top