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Proceedings Paper

Topcoat-free ArF negative tone resist
Author(s): Tomoyuki Ando; Sho Abe; Ryoichi Takasu; Jun Iwashita; Shogo Matsumaru; Ryoji Watanabe; Komei Hirahara; Yujiro Suzuki; Miki Tsukano; Takeshi Iwai
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Paper Abstract

We report the development and applications of ArF negative tone resist for ArF immersion lithography. New developed topcoat-free ArF negative tone resists has sufficient water repellent capability that is applicable to over 700mm/s scan speed water immersion exposure tool and suitable leaching suppression capability within reaching specification of exposure tool. We demonstrated lithographic performance of topcoat-free negative tone resist utilizing 1.07NA immersion tool and confirmed the lithographic window of 55nm 1L1S and 50nm 1L1S. And 27.4nm of isolated space pattern at over dose condition of 55nm 1L1S patterning. This result shows the possibility of topcoat free negative tone resist for dual trench based litho-etch-litho-etch double patterning. Additionally we have demonstrated contact hole patterning utilizing double exposure and generated 65nm gridded contact hole patterns utilizing 0.92NA ArF scanner with applicable pattern profiles.

Paper Details

Date Published: 1 April 2009
PDF: 12 pages
Proc. SPIE 7273, Advances in Resist Materials and Processing Technology XXVI, 727308 (1 April 2009); doi: 10.1117/12.813787
Show Author Affiliations
Tomoyuki Ando, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Sho Abe, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Ryoichi Takasu, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Jun Iwashita, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Shogo Matsumaru, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Ryoji Watanabe, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Komei Hirahara, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Yujiro Suzuki, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Miki Tsukano, Tokyo Ohka Kogyo Co., Ltd. (Japan)
Takeshi Iwai, Tokyo Ohka Kogyo Co., Ltd. (Japan)


Published in SPIE Proceedings Vol. 7273:
Advances in Resist Materials and Processing Technology XXVI
Clifford L. Henderson, Editor(s)

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