Share Email Print

Proceedings Paper

Development of a high-pulse-rate EUV source
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The Energetiq EQ-10 is a medium-power (10 W/2π, 13.5nm +/- 1%, Xenon) EUV source suitable for a variety of mirror testing, resist exposure, and defect inspection applications. The EQ-10 was designed to operate at a pulse frequency of 1 to 2 kHz1. However, exposure equipment appropriate for High Volume Manufacturing (HVM) requires sources which are projected to operate at 10 kHz or greater2. To minimize technical risk in infrastructure development programs now under way in support of future HVM production, scaling of various physical processes with pulse rate require investigation. A program to redesign the EQ-10 to operate at 10 kHz pulse rate has been completed. We report here on the design process and the operating characteristics of the high-frequency source.

Paper Details

Date Published: 18 March 2009
PDF: 6 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 72713A (18 March 2009); doi: 10.1117/12.813765
Show Author Affiliations
Stephen F. Horne, Energetiq Technology, Inc. (United States)
Fred M. Niell, Energetiq Technology, Inc. (United States)
Matthew J. Partlow, Energetiq Technology, Inc. (United States)
Matthew M. Besen, Energetiq Technology, Inc. (United States)
Donald K. Smith, Energetiq Technology, Inc. (United States)
Paul A. Blackborow, Energetiq Technology, Inc. (United States)
Deborah Gustafson, Energetiq Technology, Inc. (United States)

Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

© SPIE. Terms of Use
Back to Top