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Proceedings Paper

PML2: the maskless multibeam solution for the 22nm node and beyond
Author(s): C. Klein; E. Platzgummer; J. Klikovits; W. Piller; H. Loeschner; T. Bejdak; P. Dolezel; V. Kolarik; W. Klingler; F. Letzkus; J. Butschke; M. Irmscher; M. Witt; W. Pilz; P. Jaschinsky; F. Thrum; C. Hohle; J. Kretz; J. T. Nogatch; A. Zepka
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Paper Abstract

Projection Mask-Less Lithography (PML2) is a potentially cost-effective multi electron-beam solution for the 22 nm half-pitch node and beyond. PML2 is targeted on using hundreds of thousands of individually addressable electron-beams working in parallel, thereby pushing the potential throughput into the wafers per hour regime. With resolution potential of < 10 nm, PML2 is designed to meet the requirements of several upcoming tool generations.

Paper Details

Date Published: 18 March 2009
PDF: 12 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 72710N (18 March 2009); doi: 10.1117/12.813670
Show Author Affiliations
C. Klein, IMS Nanofabrication AG (Austria)
E. Platzgummer, IMS Nanofabrication AG (Austria)
J. Klikovits, IMS Nanofabrication AG (Austria)
W. Piller, IMS Nanofabrication AG (Austria)
H. Loeschner, IMS Nanofabrication AG (Austria)
T. Bejdak, DELONG INSTRUMENTS (Czech Republic)
P. Dolezel, DELONG INSTRUMENTS (Czech Republic)
V. Kolarik, DELONG INSTRUMENTS (Czech Republic)
W. Klingler, Institut für Mikroelektronik Stuttgart (Germany)
F. Letzkus, Institut für Mikroelektronik Stuttgart (Germany)
J. Butschke, Institut für Mikroelektronik Stuttgart (Germany)
M. Irmscher, Institut für Mikroelektronik Stuttgart (Germany)
M. Witt, Fraunhofer-Institut für Siliziumtechnologie (Germany)
W. Pilz, Fraunhofer-Institut für Siliziumtechnologie (Germany)
P. Jaschinsky, Fraunhofer-Ctr. Nanoelectronic Technology (Germany)
F. Thrum, Qimonda Dresden GmbH & Co. OHG (Germany)
C. Hohle, Qimonda Dresden GmbH & Co. OHG (Germany)
J. Kretz, Qimonda Dresden GmbH & Co. OHG (Germany)
J. T. Nogatch, Synopsys, Inc. (United States)
A. Zepka, Synopsys, Inc. (United States)


Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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