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Proceedings Paper

Scanner matching optimization
Author(s): Michiel Kupers; Patrick Klingbeil; Joerg Tschischgale; Stefan Buhl; Fritjof Hempel
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Paper Abstract

Cost of ownership of scanners for the manufacturing of front end layers is becoming increasingly expensive. The ability to quickly switch the production of a layer to another scanner in case it is down is important. This paper presents a method to match the scanner grids in the most optimal manner so that use of front end scanners in effect becomes interchangeable. A breakdown of the various components of overlay is given and we discuss methods to optimize the matching strategy in the fab. A concern here is how to separate the scanner and process induced effects. We look at the relative contributions of intrafield and interfield errors caused by the scanner and the process. Experimental results of a method to control the scanner grid are presented and discussed. We compare the overlay results before and after optimizing the scanner grids and show that the matching penalty is reduced by 20%. We conclude with some thoughts on the need to correct the remaining matching errors.

Paper Details

Date Published: 23 March 2009
PDF: 7 pages
Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72723B (23 March 2009); doi: 10.1117/12.813668
Show Author Affiliations
Michiel Kupers, Qimonda Dresden GmbH & Co. OHG (Germany)
Patrick Klingbeil, Qimonda Dresden GmbH & Co. OHG (Germany)
Joerg Tschischgale, Qimonda Dresden GmbH & Co. OHG (Germany)
Stefan Buhl, Qimonda Dresden GmbH & Co. OHG (Germany)
Fritjof Hempel, Qimonda Dresden GmbH & Co. OHG (Germany)


Published in SPIE Proceedings Vol. 7272:
Metrology, Inspection, and Process Control for Microlithography XXIII
John A. Allgair; Christopher J. Raymond, Editor(s)

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