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Proceedings Paper

Durability of capped multilayer mirrors for high volume manufacturing extreme ultraviolet lithography tool
Author(s): S. Matsunari; Y. Kakutani; T. Aoki; S. Kawata; K. Murakami
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Paper Abstract

Si/Mo multi-layer mirrors are oxidized by a photochemical reaction with water gas and extreme ultraviolet (EUV) light. They do not have enough durability in EUV lithography tools. 14 types of capped mirror samples (SiO2, TiO2, V2O5, Cr2O3, Mn2O3, Y2O3, Nb2O5, RuO2, Rh2O3, PdO, SnO2, La2O3, CeO2, WO3-capped) have been investigated on the anti-oxidation property under the 150-1600J/mm2 EUV irradiation at SR facilities. We have irradiated samples under the 1x10-4Pa and 9x10-4Pa water vapors. TiO2, V2O5, Cr2O3, Nb2O5, CeO2-capped mirror samples suppress reflectance drops and Si layers oxidation. These metal ions have similar radii. We have measured local structure of the RuO2 layer with lower durability. The RuO2 layer is amorphous. This Amorphous RuO2 layer loses the long range order of bonds and the short range order of the first shell. The Ru-O bonds remains with losing coordination number. To accelerate durability tests for a high volume machine, we have constructed a new dedicated beam line at the SAGA Light Source.

Paper Details

Date Published: 18 March 2009
PDF: 9 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 72713R (18 March 2009); doi: 10.1117/12.813640
Show Author Affiliations
S. Matsunari, Nikon Corp. (Japan)
Y. Kakutani, Nikon Corp. (Japan)
T. Aoki, Nikon Corp. (Japan)
S. Kawata, Nikon Corp. (Japan)
K. Murakami, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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