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Proceedings Paper

True polarization characteristics of hyper-NA optics excluding impact of measurement system
Author(s): Toru Fujii; Ken-ichi Muramatsu; Noriyuki Matsuo; Yasihiro Ohmura; Masayasu Sawada
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Paper Abstract

High lens numerical aperture for improving the resolution of a lithographic lens requires a high incident angle of exposure light in resist, which induces the vectorial effect. As a result, the vectorial effect has become more sensitive and vectorial fingerprint with higher accuracy has been required for effective image forming simulation. We successfully obtained true polarization characteristics of projection optics without the effect of measurement optics for more accurate image forming simulation. Accuracy of the result of separating Jones matrix of projection optics and that of measurement optics are presented.

Paper Details

Date Published: 16 March 2009
PDF: 12 pages
Proc. SPIE 7274, Optical Microlithography XXII, 72743K (16 March 2009); doi: 10.1117/12.813611
Show Author Affiliations
Toru Fujii, Nikon Corp. (Japan)
Ken-ichi Muramatsu, Nikon Corp. (Japan)
Noriyuki Matsuo, Nikon Systems, Inc. (Japan)
Yasihiro Ohmura, Nikon Corp. (Japan)
Masayasu Sawada, Nikon Systems, Inc. (Japan)


Published in SPIE Proceedings Vol. 7274:
Optical Microlithography XXII
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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