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Proceedings Paper

Overlay mark optimization using the KTD signal simulation system
Author(s): Anat Marchelli; Karsten Gutjahr; Michael Kubis; Christian Sparka; Mark Ghinovker; Alessandra Navarra; Amir Widmann
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Paper Abstract

As the overlay performance and accuracy requirements become tighter, the impact of process parameters on the target signal becomes more significant. Traditionally, in order to choose the optimum overlay target, several candidates are placed in the kerf area. The candidate targets are tested under different process conditions, before the target to be used in mass production is selected. The varieties of targets are left on the mass production mask and although they will not be used for overlay measurements they still consume kerf real estate. To improve the efficiency of the process we are proposing the KTD (KLA-Tencor Target Designer). It is an easy to use system that enables the user to select the optimum target based on advanced signal simulation. Implementing the KTD in production is expected to save 30% of kerf real estate due to more efficient target design process as well as reduced engineering time. In this work we demonstrate the capability of the KTD to simulate the Archer signal in the context of advanced DRAM processes. For several stacks we are comparing simulated target signals with the Archer100 signals. We demonstrate the robustness feature in the KTD application that enables the user to test the target sensitivity to process changes. The results indicate the benefit of using KTD in the target optimization process.

Paper Details

Date Published: 23 March 2009
PDF: 10 pages
Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72722Y (23 March 2009); doi: 10.1117/12.813594
Show Author Affiliations
Anat Marchelli, KLA-Tencor Corp. (Israel)
Karsten Gutjahr, Qimonda Dresden GmbH & Co. OHG (Germany)
Michael Kubis, Qimonda Dresden GmbH & Co. OHG (Germany)
Christian Sparka, KLA-Tencor Corp. (Israel)
Mark Ghinovker, KLA-Tencor Corp. (Israel)
Alessandra Navarra, Qimonda Dresden GmbH & Co. OHG (Germany)
Amir Widmann, KLA-Tencor Corp. (Israel)

Published in SPIE Proceedings Vol. 7272:
Metrology, Inspection, and Process Control for Microlithography XXIII
John A. Allgair; Christopher J. Raymond, Editor(s)

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