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Proceedings Paper

Analysis of carbon deposition on multilayer mirrors by using two different beamlines
Author(s): Takahiro Nakayama; Akira Miyake; Hiromitsu Takase; Shigeru Terashima; Takashi Sudo; Yutaka Watanabe; Yasuaki Fukuda
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Paper Abstract

It is very important to mitigate oxidation of multilayer mirrors (MLMs) and carbon deposition onto MLMs to extend the lifetime of EUV exposure tool. In order to estimate the lifetime, we have to figure out scaling law. Previous results at EUVA have shown that carbon deposition rate on MLMs is not proportional to every hydrocarbon partial pressure and every EUV intensity3-4. In this study we focused on carbon deposition on Si-capped multilayer mirror. We made experiments of EUV irradiation to the MLMs using two different apparatuses. One is connected to a beamline (SBL-2) of synchrotron radiation facility Super-ALIS in the NTT Atsugi research and development center, and the other is connected to a beamline (BL9) of synchrotron radiation facility New SUBARU in the University of Hyogo. As the result of experiments, we found that different carbon deposition rate occurred on the different beamlines, although they have the same average EUV intensity. We present differences of carbon deposition rate on MLMs between two different beamlines and estimation of carbon deposition rate on EUV tool analyzing dependences of carbon deposition rate on characteristics of EUV source.

Paper Details

Date Published: 18 March 2009
PDF: 8 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 72713P (18 March 2009); doi: 10.1117/12.813587
Show Author Affiliations
Takahiro Nakayama, Canon, Inc. (Japan)
Akira Miyake, Canon, Inc. (Japan)
Hiromitsu Takase, Canon, Inc. (Japan)
Shigeru Terashima, Canon, Inc. (Japan)
Takashi Sudo, Canon, Inc. (Japan)
Yutaka Watanabe, Canon, Inc. (Japan)
Yasuaki Fukuda, Canon, Inc. (Japan)


Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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