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Proceedings Paper

Progress on high-refractive index materials for the next-generation ArF immersion lithography
Author(s): Zhi Liu; Taiichi Furukawa; Takanori Kishida; Kyouyuu Yasuda; Tsutomu Shimokawa; Mark Slezak; David Torres; Waleska Gonzales; Keita Sakai; Sunao Mori; Yuichi Iwasaki; Shin-ichi Hara; Katsuhiko Hieda
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Paper Details

Date Published:
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Proc. SPIE 7274, Optical Microlithography XXII, ; doi: 10.1117/12.813576
Show Author Affiliations
Zhi Liu, JSR Micro, Inc. (United States)
Taiichi Furukawa, JSR Micro, Inc. (United States)
Takanori Kishida, JSR Corp. (Japan)
Kyouyuu Yasuda, JSR Corp. (Japan)
Tsutomu Shimokawa, JSR Corp. (Japan)
Mark Slezak, JSR Micro, Inc. (United States)
David Torres, JSR Micro, Inc. (United States)
Waleska Gonzales, JSR Micro, Inc. (United States)
Keita Sakai, Canon Inc. (Japan)
Sunao Mori, Canon Inc. (Japan)
Yuichi Iwasaki, Canon Inc. (Japan)
Shin-ichi Hara, Canon Inc. (Japan)
Katsuhiko Hieda, JSR Corp. (Japan)


Published in SPIE Proceedings Vol. 7274:
Optical Microlithography XXII
Harry J. Levinson; Mircea V. Dusa, Editor(s)

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