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Proceedings Paper

Evaluation of e-beam correction methodology for compensation of EUVL mask nonflatness
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Proc. SPIE 7271, Alternative Lithographic Technologies, ; doi: 10.1117/12.813495
Show Author Affiliations
Jaewoong Sohn, SEMATECH, Inc. (United States)
Kevin Orvek, SEMATECH, Inc. (United States)
Roxann L. Engelstad, Univ. of Wisconsin, Madison (United States)
John G. Hartley, Univ. at Albany (United States)


Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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