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Proceedings Paper

Evaluation at the intermediate focus for EUV light source
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Paper Abstract

We are developing a CO2 laser driven Sn plasma light source for HVM EUVL. This source enables cost-effective high-conversion efficiency (CE >4%) and EUV power scaling. To evaluate light source characteristics we developed a metrology tool for the EUV and for the out of band (DUV, IR) wavelength region. The EUV plasma light source emits radiation ranging from the EUV to the IR. To evaluate a particular wavelength region, spectral purity filters are used to select the region of interest. For the in-band EUV emission the power, the energy stability and the radiation profile are measured. The power is measured with an attenuating filter and a powermeter. The energy stability is measured with a filterd X-ray diode. The radiation profile is measured with a phosphor plate and a VIS-CCD camera. For the out of band emission, the radiated power is measured with an attenuating filter and a powermeter. The out of band region includes the CO2 laser which is partly scattered by the plasma and reflected towards the IF and needs therefore to be included into the measurement.

Paper Details

Date Published: 18 March 2009
PDF: 8 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 727133 (18 March 2009); doi: 10.1117/12.813494
Show Author Affiliations
Takashi Suganuma, EUVA (Japan)
Georg Soumagne, EUVA (Japan)
Masato Moriya, EUVA (Japan)
Tamotsu Abe, EUVA (Japan)
Akira Sumitani, EUVA (Japan)
Akira Endo, EUVA (Japan)


Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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