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Proceedings Paper

Elucidating the photo-resist topography of a tri-layer structure using a novel reaction hypothesis in resist/Si-HM interface
Author(s): Ming-Hang Yang; Lan-Hsin Peng; Chih-Wei Chu; Jerry Huang
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Proc. SPIE 7273, Advances in Resist Materials and Processing Technology XXVI, ; doi: 10.1117/12.813467
Show Author Affiliations
Ming-Hang Yang, ProMOS Technologies, Inc. (Taiwan)
Lan-Hsin Peng, ProMOS Technologies, Inc. (Taiwan)
Chih-Wei Chu, ProMOS Technologies, Inc. (Taiwan)
Jerry Huang, ProMOS Technologies, Inc. (Taiwan)


Published in SPIE Proceedings Vol. 7273:
Advances in Resist Materials and Processing Technology XXVI
Clifford L. Henderson, Editor(s)

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