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Proceedings Paper

Development status of Canon's full-field EUVL tool
Author(s): Takayuki Hasegawa; Shigeyuki Uzawa; Tokuyuki Honda; Yoshinari Higaki; Akira Miyake; Hideki Morishima
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Paper Abstract

EUVL is the most promising candidate of 32 nm generations and beyond. In this paper, we present Canon's development status of EUVL technologies. The system design of the EUV full field high volume manufacturing tool (VS2) is under way. The specification of VS2 is presented in this paper. The fabrication of six-aspheric-mirror prototype projection optics (PO1) of NA 0.3 has been started. The PO1 is fabricated to evaluate and improve our technologies of polishing and measuring the figure of mirrors. We present some results of the figuring accuracy of the mirror. EUVL will be required to resolve sub-twenty nm L&S patterns. We are studying off-axis illumination technologies and high- NA technologies. The simulation results of the resolution capability and the DOF are presented.

Paper Details

Date Published: 17 March 2009
PDF: 10 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 72711Y (17 March 2009); doi: 10.1117/12.813465
Show Author Affiliations
Takayuki Hasegawa, Canon Inc. (Japan)
Shigeyuki Uzawa, Canon Inc. (Japan)
Tokuyuki Honda, Canon Inc. (Japan)
Yoshinari Higaki, Canon Inc. (Japan)
Akira Miyake, Canon Inc. (Japan)
Hideki Morishima, Canon Inc. (Japan)


Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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