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Proceedings Paper

Super photoacid generators (SPAGs)-based chemical amplified resists for EUV lithography
Author(s): Mingxing Wang; kenneth E Gonsalves
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Paper Details

Date Published:
PDF: 11 pages
Proc. SPIE 7273, Advances in Resist Materials and Processing Technology XXVI, 72731S; doi: 10.1117/12.813404
Show Author Affiliations
Mingxing Wang, The Univ. of North Carolina at Charlotte (United States)
kenneth E Gonsalves, University of North Carolina, Charlotte (United States)


Published in SPIE Proceedings Vol. 7273:
Advances in Resist Materials and Processing Technology XXVI
Clifford L. Henderson, Editor(s)

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