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Proceedings Paper

Novel resist for replica preparation of mold for imprint lithography
Author(s): Daisaku Matsukawa; Hiroyuki Wakayama; Kazuyuki Mitsukura; Haruyuki Okamura; Yoshihiko Hirai; Masamitsu Shirai
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Paper Abstract

Two types of dimethacrylate which have hemiacetal ester moiety in a molecule were synthesized from difunctional vinyl ethers and methacrylic acid. UV curing of the monomers and photo-induced degradation of the UV cured resins were investigated. On UV irradiation at 365 nm under N2 atmosphere, these dimethacrylates containing 2,2-dimethoxy-2-phenylacetophenone and triphenylsulfonium triflate became insoluble in methanol. The UV cured resins degraded if acids were generated in the system. Present resins were applied to make a plastic replica of mold for imprint lithography and the plastic replica was prepared in good form. The effect of imprint conditions on volume shrinkage of methacrylates was investigated. Dimethacrylate that has adamantyl unit showed a low-shrinkage property.

Paper Details

Date Published: 1 April 2009
PDF: 10 pages
Proc. SPIE 7273, Advances in Resist Materials and Processing Technology XXVI, 72730T (1 April 2009); doi: 10.1117/12.813383
Show Author Affiliations
Daisaku Matsukawa, Osaka Prefecture Univ. (Japan)
Hiroyuki Wakayama, Osaka Prefecture Univ. (Japan)
Kazuyuki Mitsukura, Osaka Prefecture Univ. (Japan)
Haruyuki Okamura, Osaka Prefecture Univ. (Japan)
Yoshihiko Hirai, Osaka Prefecture Univ. (Japan)
Masamitsu Shirai, Osaka Prefecture Univ. (Japan)


Published in SPIE Proceedings Vol. 7273:
Advances in Resist Materials and Processing Technology XXVI
Clifford L. Henderson, Editor(s)

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