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Proceedings Paper

Monitor and self-diagnostic technology for mask e-beam writing system
Author(s): Norihiko Samoto; Hironobu Manabe; Osamu Wakimoto; Satoshi Iida; Hiromichi Hoshi; Masaki Yamabe
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Paper Abstract

The accuracy of line-width control and image placement on mask has become a matter of serious concerns with continued reduction of design rules in semiconductor device fabrication. The smallest changes in environment during mask-exposure can cause significant damage to mask since these deviations result in increased mask cost because the number of times that a mask is repaired and reproduced increases. In the year 2006, Mask Design, Drawing, and Inspection Technology Research Department (Mask D2I) at the Association of Super-Advanced Electronics Technologies (ASET) launched a 4-year development program for the optimization of mask design, drawing, and inspection to reduce the manufacturing cost of photo-mask. In this program, we are developing a self-diagnostic technology that can monitor the process of data transfer and check the environment during exposure to improve the reliability of the mask writer. This technology, by detecting the process deviations before they occur can increase the efficiency of mask inspection.

Paper Details

Date Published: 18 March 2009
PDF: 8 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 72712R (18 March 2009); doi: 10.1117/12.813360
Show Author Affiliations
Norihiko Samoto, Association of Super-Advanced Electronics Technologies (Japan)
Hironobu Manabe, Association of Super-Advanced Electronics Technologies (Japan)
Osamu Wakimoto, Association of Super-Advanced Electronics Technologies (Japan)
Satoshi Iida, Association of Super-Advanced Electronics Technologies (Japan)
Hiromichi Hoshi, Association of Super-Advanced Electronics Technologies (Japan)
Masaki Yamabe, Association of Super-Advanced Electronics Technologies (Japan)


Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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