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Proceedings Paper

Characterization of vinyl ether UV-cure nanoimprint resist
Author(s): Taiichi Furukawa; Frances A. Houle; Deborah L. Casher; Dolores C. Miller
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Paper Abstract

UV-curable resist formulations for nanoimprint must satisfy many requirements for viscosity, volatility, curing rate, cohesion of the cured material and release from the template in addition to being successfully imprintable. In this paper we describe studies of several vinyl ether resist systems. Although all resist formulations have low viscosity, low volatility and fast curing rate, significant variations in mechanical, fracture energy properties, fracture behaviors and cured film roughness with resist compositions are found. The results show the addition of reactive diluent to resist can lead to low fracture energy and low cured film roughness, consistent with significant control of the cured resist plasticity.

Paper Details

Date Published: 18 March 2009
PDF: 6 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 727129 (18 March 2009); doi: 10.1117/12.813065
Show Author Affiliations
Taiichi Furukawa, JSR Micro, Inc. (United States)
Frances A. Houle, IBM Almaden Research Ctr. (United States)
Deborah L. Casher, IBM Almaden Research Ctr. (United States)
Dolores C. Miller, IBM Almaden Research Ctr. (United States)

Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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