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Proceedings Paper

Development of optical simulation tool for defect inspection
Author(s): Takayoshi Fujii; Yusaku Konno; Naotada Okada; Kiminori Yoshino; Yuuichiro Yamazaki
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Paper Abstract

Much effort has been done to detect the defects of interest (DOI) by optical inspection systems because the size of the DOI shrinks according to the design rule of a semiconductor device. Performance of the inspection system is dependent on complicated optical conditions on illumination and collection systems including wavelength and polarization filter. Magnitude of defect signal for a given optical condition was estimated using a simulation tool to find a suitable optical condition and technologies required in the future. This tool, consisting of a near-field calculation using Finite Difference Time Domain (FDTD) methods and an image formation calculation based on Fourier optics, is applicable not only to Köhler illumination system but also to confocal system and dark field system. We investigated defect inspection methods for the 45 nm and the next technology nodes. For inspection of various defects, the system using several wavelengths is suitable. For inspection of a specific defect, the system with polarization control is suitable. Our calculation suggests that the defect detection sensitivity for the 1X nm technology node should be increased by more than 10 times compared to the 45 nm technology node.

Paper Details

Date Published: 23 March 2009
PDF: 9 pages
Proc. SPIE 7272, Metrology, Inspection, and Process Control for Microlithography XXIII, 72721A (23 March 2009); doi: 10.1117/12.812472
Show Author Affiliations
Takayoshi Fujii, Toshiba Corp. (Japan)
Yusaku Konno, Toshiba Corp. (Japan)
Naotada Okada, Toshiba Corp. (Japan)
Kiminori Yoshino, Toshiba Corp. (Japan)
Yuuichiro Yamazaki, Toshiba Corp. (Japan)

Published in SPIE Proceedings Vol. 7272:
Metrology, Inspection, and Process Control for Microlithography XXIII
John A. Allgair; Christopher J. Raymond, Editor(s)

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