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Proceedings Paper

Interference assisted lithography for patterning of 1D gridded design
Author(s): Robert T. Greenway; Rudolf Hendel; Kwangok Jeong; Andrew B. Kahng; John S. Petersen; Zhilong Rao; Michael C. Smayling
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Paper Abstract

We present Interference Assisted Lithography (IAL) as a promising and cost-effective solution for extending lithography. IAL achieves a final pattern by combining an interference exposure with a trim exposure. The implementation of IAL requires that today's 2D random layouts be converted to highly regular 1D gridded designs. We show that an IAL-friendly 6T SRAM bitcell can be designed following 1D gridded design rules and that the electrical characteristics is comparable to today's 2D design. Lithography simulations confirm that the proposed bitcell can be successfully imaged with IAL.

Paper Details

Date Published: 18 March 2009
PDF: 11 pages
Proc. SPIE 7271, Alternative Lithographic Technologies, 72712U (18 March 2009); doi: 10.1117/12.812033
Show Author Affiliations
Robert T. Greenway, Petersen Advanced Lithography, Inc. (United States)
Rudolf Hendel, Applied Materials, Inc. (United States)
Kwangok Jeong, Univ. of California, San Diego (United States)
Andrew B. Kahng, Univ. of California, San Diego (United States)
John S. Petersen, Petersen Advanced Lithography, Inc. (United States)
Zhilong Rao, Applied Materials, Inc. (United States)
Michael C. Smayling, Tela Innovations, Inc. (United States)


Published in SPIE Proceedings Vol. 7271:
Alternative Lithographic Technologies
Frank M. Schellenberg; Bruno M. La Fontaine, Editor(s)

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