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Proceedings Paper

Polysilane optical waveguide devices using photo-bleaching effect
Author(s): Soichi Kobayashi; Toshihiro Suda; Takumi Ishiguro; Daiki Motoyoshi; Yoshiaki Yamabayashi
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Paper Abstract

The polysilane optical waveguide fabrications by using photo-bleaching technology with the UV lamp and the UV laser direct drawing technologies are reported. The characteristics of the 1xN optical waveguide splitters and the semiconductor tunable lasers (STLs) with polymer tunable external resonators are presented. An average propagation loss of the straight waveguide was less than 0.7dB/cm at 1550 nm. PDL was measured less than 0.5 dB in the case of 1×8 splitter. The insertion loss of 1×4 splitter patterned by laser drawing method was measured less than 7.5 dB/cm. In the STLs the external resonator consists of a singlemode polysilane waveguide and a Bragg grating filter. The power ratio between main and side modes was over 30 dB. Laser power was measured as 5.6 mW at 70% reflective index of the Bragg grating.

Paper Details

Date Published: 10 February 2009
PDF: 11 pages
Proc. SPIE 7219, Optoelectronic Integrated Circuits XI, 721907 (10 February 2009); doi: 10.1117/12.811790
Show Author Affiliations
Soichi Kobayashi, Chitose Institute of Science and Technology (Japan)
Toshihiro Suda, Photonic Science Technology, Inc. (Japan)
Takumi Ishiguro, Chitose Institute of Science and Technology (Japan)
Daiki Motoyoshi, Chitose Institute of Science and Technology (Japan)
Yoshiaki Yamabayashi, Chitose Institute of Science and Technology (Japan)


Published in SPIE Proceedings Vol. 7219:
Optoelectronic Integrated Circuits XI
Louay A. Eldada; El-Hang Lee, Editor(s)

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