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Proceedings Paper

Advances in diffractive nanophotonics enabled by commercial photoreduction lithography
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Paper Abstract

We describe monolithic advanced-function diffraction grating arrays for instantaneous ultrawide spectral coverage and other uses that have inherent spectral and spatial self-calibration features. This new technology is made possible by recent advances in deep ultraviolet (DUV) reduction-lithographic fabrication.

Paper Details

Date Published: 24 February 2009
PDF: 5 pages
Proc. SPIE 7205, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II, 72050L (24 February 2009); doi: 10.1117/12.811619
Show Author Affiliations
Christoph M. Greiner, LightSmyth Technologies, Inc. (United States)
Dmitri Iazikov, LightSmyth Technologies, Inc. (United States)
Thomas W. Mossberg, LightSmyth Technologies, Inc. (United States)


Published in SPIE Proceedings Vol. 7205:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II
Thomas J. Suleski; Winston V. Schoenfeld; Jian Jim Wang, Editor(s)

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