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Proceedings Paper

Large-area plasmonic structures fabricated by laser nanopatterning and their applications
Author(s): M. H. Hong; C. H. Liu; F. Ma; Z. C. Chen; B. Luk'yanchuk; L. P. Shi; T. C. Chong
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Paper Abstract

Laser interference lithography is applied to fabricate large-area plasmonic nanostructures. This approach has the advantages of being non-contact process in air and able to achieve large-area and maskless nanolithography at a high speed with low system investment. Single layer Au or Ag noble metallic thin film and Ag/Au, Ag/Ni or Au/Ni bimetallic layer thin films are patterned into nano-dot, nano-rod and nano-nut arrays by laser interference lithography. Plasmonic effects of the fabricated metallic nanostructures are studied. Tunable and multi-peak surface plasmon resonances of these nanostructures can be obtained, which have potential applications in solar cells, bio-sensing and photonic circuits.

Paper Details

Date Published: 24 February 2009
PDF: 10 pages
Proc. SPIE 7202, Laser-based Micro- and Nanopackaging and Assembly III, 72020K (24 February 2009); doi: 10.1117/12.810460
Show Author Affiliations
M. H. Hong, National Univ. of Singapore (Singapore)
Data Storage Institute (Singapore)
C. H. Liu, National Univ. of Singapore (Singapore)
F. Ma, National Univ. of Singapore (Singapore)
Z. C. Chen, National Univ. of Singapore (Singapore)
Data Storage Institute (Singapore)
B. Luk'yanchuk, Data Storage Institute (Singapore)
L. P. Shi, Data Storage Institute (Singapore)
T. C. Chong, National Univ. of Singapore (Singapore)
Data Storage Institute (Singapore)


Published in SPIE Proceedings Vol. 7202:
Laser-based Micro- and Nanopackaging and Assembly III
Wilhelm Pfleging; Yongfeng Lu; Kunihiko Washio; Willem Hoving; Jun Amako, Editor(s)

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