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Proceedings Paper

What is the strongest candidate in lithography for 2x nm HP and beyond? 
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Paper Abstract

We have investigated three candidate lithography technologies for 2x nm HP generation and beyond for the application to LSI, namely, double patterning technology (DPT), EUV lithography (EUVL) and nanoimprint lithography (NIL). In terms of lithography unit technologies and lithography integration technologies, each technology has advantages and disadvantages from the viewpoint of difficulty, development resources, extendability, process cost, and so on. Using a development matrix consisting of development steps and development stages, we clarified the current development status for each technology. This matrix indicates the items for which technological critical breakthroughs are necessary to realize LSI production. From this study, we made three lithography development scenarios for the feasibility stage and the production stage for 2x nm HP generation and beyond.

Paper Details

Date Published: 1 December 2008
PDF: 15 pages
Proc. SPIE 7140, Lithography Asia 2008, 71400A (1 December 2008); doi: 10.1117/12.810264
Show Author Affiliations
Kohji Hashimoto, Toshiba Corp. (Japan)
Ikuo Yoneda, Toshiba Corp. (Japan)
Takeshi Koshiba, Toshiba Corp. (Japan)
Shinji Mikami, Toshiba Corp. (Japan)
Takumi Ota, Toshiba Corp. (Japan)
Masamitsu Ito, Toshiba Corp. (Japan)
Tetsuro Nakasugi, Toshiba Corp. (Japan)
Tatsuhiko Higashiki, Toshiba Corp. (Japan)


Published in SPIE Proceedings Vol. 7140:
Lithography Asia 2008
Alek C. Chen; Burn Lin; Anthony Yen, Editor(s)

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