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Proceedings Paper

High-speed roll-to-roll nanoimprint lithography on flexible substrate and mold-separation analysis
Author(s): Se Hyun Ahn; L. Jay Guo
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Paper Abstract

Continuous Roll-to-Roll NanoImprint Lithography (R2RNIL) provides greatly improved throughput by overcoming the challenges faced by conventional NIL in maintaining pressure uniformity and successful large-area imprinting and demolding. We present continuous imprinting of nanoscale structures with linewidth down to 70nm on a flexible plastic substrate. Our new process used a flexible and non-sticking fluoropolymer mold, and fast thermal and UV curable liquid resist materials. In addition, pattern quality in continuous R2RNIL process according to two different mold-separation directions has been analytically investigated.

Paper Details

Date Published: 24 February 2009
PDF: 10 pages
Proc. SPIE 7205, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II, 72050U (24 February 2009); doi: 10.1117/12.809821
Show Author Affiliations
Se Hyun Ahn, Univ. of Michigan (United States)
L. Jay Guo, Univ. of Michigan (United States)

Published in SPIE Proceedings Vol. 7205:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II
Thomas J. Suleski; Winston V. Schoenfeld; Jian Jim Wang, Editor(s)

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