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Proceedings Paper

Monolithic 1.58-micron InAs/InP quantum dash passively mode-locked lasers
Author(s): C.-Y. Lin; Y.-C. Xin; N. A. Naderi; F. L. Chiragh; L. F. Lester
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Paper Abstract

Monolithic InAs quantum dash 1.58-micron passively mode-locked lasers grown on an InP substrate are reported. A repetition rate of up to 18.5 GHz has been realized. The dashes-in-a-well (DWELL) active region consists of 5 stacks of InAs quantum dashes embedded in compressively strained Al0.20Ga0.16In0.64As quantum wells separated by 30-nm undoped tensile-strained Al0.28Ga0.22In0.50As spacers on both sides of the DWELL. 4 micron-wide ridge waveguides with cavity lengths in the range of 2.3 to 4 mm were fabricated with multiple electrically-isolated anode contacts. The modal gain and loss spectra of the InAs active region were then measured through the improved segmented contact method, and the characteristics that make InAs quantum dash materials system desirable for semiconductor mode-locked lasers were identified. The segmented waveguides were then reconfigured into mode-locked lasers by wire bonding the segments together to form separate gain and absorber regions utilizing the same DWELL active region. A highly reflective coating (95%) was applied to the mirror facet next to the absorber while the other facet was cleaved. To assist in the cavity design and to determine the relative length of the absorber and gain sections, a model for the cavity geometry of the twosection passively mode-locked lasers was studied and is based on a microwave photonics perspective. A new set of theoretical equations was used to find the optimal device layout using the measured modal gain and loss characteristics as input data.

Paper Details

Date Published: 24 February 2009
PDF: 8 pages
Proc. SPIE 7211, Physics and Simulation of Optoelectronic Devices XVII, 721118 (24 February 2009); doi: 10.1117/12.809640
Show Author Affiliations
C.-Y. Lin, Univ. of New Mexico (United States)
Y.-C. Xin, Univ. of New Mexico (United States)
N. A. Naderi, Univ. of New Mexico (United States)
F. L. Chiragh, Univ. of New Mexico (United States)
L. F. Lester, Univ. of New Mexico (United States)


Published in SPIE Proceedings Vol. 7211:
Physics and Simulation of Optoelectronic Devices XVII
Marek Osinski; Bernd Witzigmann; Fritz Henneberger; Yasuhiko Arakawa, Editor(s)

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