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Proceedings Paper

Microlithographically patterned optical thin film coatings
Author(s): Jim Lane; Phil Buchsbaum; Jason M. Eichenholz
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Paper Abstract

Until recently optical coatings have been one area that existed primarily in the macro realm. Entire optical surfaces could be coated quite easily with various thin film optical coatings. However precise deposition of patterned optical filter coatings was limited by the use of metal masking. Similarly, the dicing and bonding of individual filters together to form an assembly is a tedious process, with miniaturization limited by handling and dicing constraints. We are reporting on a new class of lithographically patterned dielectric thin film coatings that enables precision placement and patterning of dichroic and multilayer thin film coating features on a single substrate down to the micron scale. Because the process relies on precision microlithography instead of cut metal masks to pattern the deposited coatings, features (coated areas) as small as 5 microns can be produced, with spatial registration to adjacent coated areas within 1 micron. Furthermore, we report on new developments which involve patterning optical thin film filter on active photodetector substrates. The possibility of now using active devices with patterned dielectric optical filter arrays opens up a wide landscape of new opportunities in solid-state spectral sensing, from more precise color detection to enhanced multispectral imaging.

Paper Details

Date Published: 23 February 2009
PDF: 8 pages
Proc. SPIE 7205, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II, 72050G (23 February 2009); doi: 10.1117/12.809615
Show Author Affiliations
Jim Lane, Ocean Thin Films (United States)
Phil Buchsbaum, Ocean Thin Films (United States)
Jason M. Eichenholz, Ocean Optics, Inc. (United States)


Published in SPIE Proceedings Vol. 7205:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II
Thomas J. Suleski; Winston V. Schoenfeld; Jian Jim Wang, Editor(s)

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