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Proceedings Paper

Sharpened transparent micronozzle fabrication for cell membrane piercing
Author(s): E. M. Campo; M. J. Lopez-Martinez; E. Fernández; E. Ibañez; L. Barros; C. Nogues; J. Esteve; J. A. Plaza
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Paper Abstract

Sharpened cantilevered nozzles were fabricated combining microsystem technologies and focused ion beam micromachining. Micronozzles consist of silicon chips with silicon oxide microchannels whose micronozzles were reshaped using Focused Ion Beam. Micronozzle body was defined by an aluminum sacrificial layer patterned over a silicon wafer. This layer was surrounded by a deposited silicon oxide structural layer. The chip is defined by a silicon deep reactive ion etching through the wafer. This process releases part of the metal line forming a cantilevered micronozzle. Sharp reshaped micronozzles were achieved by focused ion beam milling. Mechanical tests of silicon oxide nozzles still containing the aluminum sacrificial layer were performed by cell piercing. In some instances, zona pellucida and membrane were crossed without cell lysis, and micronozzles remained intact.

Paper Details

Date Published: 23 February 2009
PDF: 8 pages
Proc. SPIE 7204, Micromachining and Microfabrication Process Technology XIV, 720407 (23 February 2009); doi: 10.1117/12.809427
Show Author Affiliations
E. M. Campo, Ctr. Nacional de Microelectrónica (Spain)
M. J. Lopez-Martinez, Ctr. Nacional de Microelectrónica (Spain)
E. Fernández, Univ. Autònoma de Barcelona (Spain)
E. Ibañez, Univ. Autònoma de Barcelona (Spain)
L. Barros, Univ. Autònoma de Barcelona (Spain)
C. Nogues, Univ. Autònoma de Barcelona (Spain)
J. Esteve, Ctr. Nacional de Microelectrónica (Spain)
J. A. Plaza, Ctr. Nacional de Microelectrónica (Spain)

Published in SPIE Proceedings Vol. 7204:
Micromachining and Microfabrication Process Technology XIV
Mary-Ann Maher; Jung-Chih Chiao; Paul J. Resnick, Editor(s)

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