Share Email Print
cover

Proceedings Paper

Experiment on microstructure fabrication with UV-LIGA technology
Author(s): Xiaohu Zheng
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

The field of micro electromechanical systems (MEMS), particularly micro sensors and transducers, has been expanding over recent years, and the production of these devices continue to grow up. With SU-8 photoresist, the technology of UV-LIGA has been developed as an important method of fabrication micro structures. The process consisting of photolithographic and microelectroforming were studied in this paper. Orthogonal experimental design were applied in research. From experiment it can be concluded that the soft bake temperature and time was the key factor of the structure quality. When the photoresist thickness ranged from 120 to 340µm, the soft bake temperature and time was 90 and 50~120 minutes, that means the perfect image. The best post expose bake temperature was 85 95 with less 40 minutes bake. In order to obtain the suitable parameters of the various thickness photoresist, an artificial neural network (ANN) with 3 layers were built. The ANN were trained based on orthogoality experiment using back propagation algorithm. Compared to the experiment results, the prediction error was less than 2.0%, which proved that the ANN was effective. The characteristics of the microelectroforming process were analysed systematically. The results showed that the mass transfer is the control factors of microelectroforming process. During the developing of the photoresist, ultrasonic stirring could shorten the developing time and improve the micro mould quality effectively.The lithographic and microelectroforming process of the fabrication of high resolute micro structure was optimized.

Paper Details

Date Published: 2 February 2009
PDF: 5 pages
Proc. SPIE 7159, 2008 International Conference on Optical Instruments and Technology: MEMS/NEMS Technology and Applications, 71590X (2 February 2009); doi: 10.1117/12.809105
Show Author Affiliations
Xiaohu Zheng, Huaiyin Institute of Technology (China)
Nanjing Univ. of Aeronautics and Astronautics (China)


Published in SPIE Proceedings Vol. 7159:
2008 International Conference on Optical Instruments and Technology: MEMS/NEMS Technology and Applications
Zhaoying Zhou; Shanhong Xia; Chih-Ming Ho; Helmut Seidel, Editor(s)

© SPIE. Terms of Use
Back to Top