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Proceedings Paper

Identifying resonance frequency deviations for high order nano-wire ring resonator filters based on a coupling strength variation
Author(s): Sahnggi Park; Kap-Joong Kim; Duk-Jun Kim; Gyungock Kim
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Paper Abstract

Third order ring resonators are designed and their resonance frequency deviations are analyzed experimentally by processing them with E-beam lithography and ICP etching in a CMOS nano-Fabrication laboratory. We developed a reliable method to identify and reduce experimentally the degree of deviation of each ring resonance frequency before completion of the fabrication process. The identified deviations can be minimized by the way to be presented in this paper. It is expected that this method will provide a significant clue to make a high order multi-channel ring resonators.

Paper Details

Date Published: 18 February 2009
PDF: 12 pages
Proc. SPIE 7220, Silicon Photonics IV, 72200Y (18 February 2009); doi: 10.1117/12.808868
Show Author Affiliations
Sahnggi Park, Electronics and Telecommunications Research Institute (Korea, Republic of)
Kap-Joong Kim, Electronics and Telecommunications Research Institute (Korea, Republic of)
Korea Advanced Institute of Science and Technology (Korea, Republic of)
Duk-Jun Kim, Electronics and Telecommunications Research Institute (Korea, Republic of)
Gyungock Kim, Electronics and Telecommunications Research Institute (Korea, Republic of)


Published in SPIE Proceedings Vol. 7220:
Silicon Photonics IV
Joel A. Kubby; Graham T. Reed, Editor(s)

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