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Proceedings Paper

Dynamic ultrafast laser beam tailoring for multispot photo-inscription of photonic devices in bulk transparent materials
Author(s): C. Mauclair; G. Cheng; N. Huot; E. Audouard; A. Rosenfeld; I. Hertel; R. Stoian
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Paper Abstract

Femtosecond laser processing of bulk transparent materials can generate localized increase of the refractive index. Thus, translation of the laser spot give potential access to three dimensionnal photowriting of waveguiding structures. Increasing the number of machining foci can considerably reduce the processing efforts when complex photonic structures are envisaged such as waveguide arrays. The present report presents a technique of dynamic ultrafast laser beam spatial tailoring for parallel writing of photonic devices. The wavefront of the beam is modulated by a periodical binary (0-π) phase mask of variable pattern to achieve dynamic multispot operation. The parallel photoinscription of multiple waveguides is demonstrated in fused silica. Using this method, light dividers in three dimensions relying on evanescent coupling are reported and wavelength-division demultiplexing (WDD) devices were achieved in single sample scan.

Paper Details

Date Published: 24 February 2009
PDF: 10 pages
Proc. SPIE 7205, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II, 720512 (24 February 2009); doi: 10.1117/12.808798
Show Author Affiliations
C. Mauclair, Lab. Hubert Curien, CNRS, Univ. Jean Monnet (France)
G. Cheng, Lab. Hubert Curien, CNRS, Univ. Jean Monnet (France)
N. Huot, Lab. Hubert Curien, CNRS, Univ. Jean Monnet (France)
E. Audouard, Lab. Hubert Curien, CNRS, Univ. Jean Monnet (France)
A. Rosenfeld, Max-Born-Institut für Nichtlineare Optik und Kurzzeitspektroskopie (Germany)
I. Hertel, Max-Born-Institut für Nichtlineare Optik und Kurzzeitspektroskopie (Germany)
Freie Univ. Berlin Fachbereich Physik (Germany)
R. Stoian, Lab. Hubert Curien, CNRS, Univ. Jean Monnet (France)


Published in SPIE Proceedings Vol. 7205:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II
Thomas J. Suleski; Winston V. Schoenfeld; Jian Jim Wang, Editor(s)

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