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Proceedings Paper

Atomic layer epitaxy of TiO2/ZnO multilayers for water-window attosecond optics
Author(s): Yuji Tanaka; Yusuke Masuda; Hiroshi Kumagai; Tsutomu Shinagawa; Ataru Kobayasi
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Paper Abstract

The development of high-reflection multilayer mirrors in the "water window" (λ=2.3-4.4nm) is desired for attosecond soft x-ray optics. TiO2/ZnO multilayer mirrors were proposed in this study as highly reflective coatings for the water window wavelength region. The theoretical calculation on the layer combination indicated that the high reflectivity of approximately 50% at 2.73 nm was obtainable at the incidence angle of 18.2° from the normal incidence. The ZnO and TiO2 thin films were grown using atomic layer epitaxy (ALE) methods at 450°C. Experimental results indicated that both the crystalline rutile TiO2 (200) and wurtzite ZnO (0001) thin films both were grown epitaxially on Al2O3 (0001) substrates by ALE. Moreover, a 10-bilayer TiO2/ZnO multilayer showed the soft X-ray reflectivity of around 10%.

Paper Details

Date Published: 24 February 2009
PDF: 9 pages
Proc. SPIE 7201, Laser Applications in Microelectronic and Optoelectronic Manufacturing VII, 72010Z (24 February 2009); doi: 10.1117/12.808169
Show Author Affiliations
Yuji Tanaka, Osaka City Univ. (Japan)
Yusuke Masuda, Osaka City Univ. (Japan)
Hiroshi Kumagai, Osaka City Univ. (Japan)
Tsutomu Shinagawa, Osaka Municipal Technical Research Institute (Japan)
Ataru Kobayasi, Osaka City Univ. (Japan)


Published in SPIE Proceedings Vol. 7201:
Laser Applications in Microelectronic and Optoelectronic Manufacturing VII
Michel Meunier; Andrew S. Holmes; Hiroyuki Niino; Bo Gu, Editor(s)

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