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Proceedings Paper

Fabrication of nanostructured ITO thin films on nanoimprinted glasses by pulsed laser deposition
Author(s): Yasuyuki Akita; Yuki Sugimoto; Masahiro Mita; Hideo Oi; Osami Sakata; Mamoru Yoshimoto
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Paper Abstract

We fabricated indium tin oxide (ITO) thin films on nanoimprinted glass substrates using pulsed laser deposition (PLD). The nanoimprinted glass substrate was prepared by thermal nanoimprint using an atomically stepped sapphire (α-Al2O3 single crystal) mold. Two kinds of sapphire molds were employed, one with a single step about 0.2 nm high and the other with a bunched step about 2 nm high. The surface morphology of the stepped sapphire mold was successfully transferred to the glass surface in an atomic scale. The nanoimprinted glass had a regular nanostepped pattern; one had a step height of about 0.2 nm and step separation of about 100 nm, the other had a step height of about 2 nm and step separation of about 1 μm. The ITO films were deposited at room-temperature (RT) or 200°C on the nanoimprinted glass substrates and on the non-patterned commercial glass for comparison. The ITO films deposited at RT were post-annealed for further crystallization. The surface of the ITO thin films deposited on the nanoimprinted glass well reflected the nanopattern of the glass substrate surface. Preferential crystalline orientation of the ITO thin films was achieved on the nanoimprinted glass substrates. The resistivity of ITO thin films deposited on the nanoimprinted glass was lower than that on the commercial glass, which was probably due to the higher crystal orientation of the films grown on the nanoimprinted glass surfaces.

Paper Details

Date Published: 24 February 2009
PDF: 9 pages
Proc. SPIE 7201, Laser Applications in Microelectronic and Optoelectronic Manufacturing VII, 72011A (24 February 2009); doi: 10.1117/12.808096
Show Author Affiliations
Yasuyuki Akita, Tokyo Institute of Technology (Japan)
Yuki Sugimoto, Tokyo Institute of Technology (Japan)
Masahiro Mita, Kyodo International Inc. (Japan)
Hideo Oi, Kyodo International Inc. (Japan)
Osami Sakata, Japan Synchrotron Radiation Research Institute (Japan)
Mamoru Yoshimoto, Tokyo Institute of Technology (Japan)


Published in SPIE Proceedings Vol. 7201:
Laser Applications in Microelectronic and Optoelectronic Manufacturing VII
Michel Meunier; Andrew S. Holmes; Hiroyuki Niino; Bo Gu, Editor(s)

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