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Proceedings Paper

OFI rare-gas excimer amplifier for high-intensity VUV pulse generation
Author(s): Masahito Katto; Masanori Kaku; Kazuyoshi Oda; Tadashi Kamikihara; Atsushi Yokotani; Shoichi Kubodera; Noriaki Miyanaga; Kunioki Mima
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Paper Abstract

We have demonstrated an argon excimer vacuum ultraviolet (VUV) amplifier at 126 nm by using the optical-field induced ionization (OFI) of argon. The gain-length product of 5.6 was achieved as a result of the optical feedback inside the amplifier with a VUV mirror. Plasma self-channeling caused by the high-intensity pump laser was simultaneously observed when the maximum gain-length product was observed. We have also optimized the output power of a subpicosecond VUV seed beam at 126 nm produced in low-pressure rare-gases as a result of the seventh harmonic nonlinear wavelength conversion of a Ti:Sapphire laser at 882 nm.

Paper Details

Date Published: 20 February 2009
PDF: 8 pages
Proc. SPIE 7196, High Energy/Average Power Lasers and Intense Beam Applications III, 71960L (20 February 2009); doi: 10.1117/12.807339
Show Author Affiliations
Masahito Katto, Univ. of Miyazaki (Japan)
Masanori Kaku, Univ. of Miyazaki (Japan)
Kazuyoshi Oda, Univ. of Miyazaki (Japan)
Tadashi Kamikihara, Univ. of Miyazaki (Japan)
Atsushi Yokotani, Univ. of Miyazaki (Japan)
Shoichi Kubodera, Univ. of Miyazaki (Japan)
Noriaki Miyanaga, Osaka Univ. (Japan)
Kunioki Mima, Osaka Univ. (Japan)


Published in SPIE Proceedings Vol. 7196:
High Energy/Average Power Lasers and Intense Beam Applications III
Steven J. Davis; Michael C. Heaven; J. Thomas Schriempf, Editor(s)

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