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Proceedings Paper

Design of nano-lithographic system based on phase photon sieve
Author(s): Wenbo Jiang; Song Hu
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Paper Abstract

A nano-lithographic system based on phase photon sieve is proposed in this paper to overcome the disadvantages of zone plate array lithographic system and amplitude photon sieve lithographic system. As an important part of the system performance, the resolution of this system is mainly decided by the diffractive element. The phase photon sieve was used as the diffractive element in the proposed system. The structure and performance of the phase photon sieve is therefore very important to the resolution of this system. So, two methods are proposed for the designs and fabrication of the lithographic system based on phase photon sieve. The feasibility of using this system to realize nano-lithography with a resolution is of less than 100nm was then discussed. It is shown through analysis that the system not only has higher resolution and image contrast than the zone plate array lithographic system but also has higher diffractive efficiency than the amplitude photon sieve lithographic system. As a novel lithographic technique, the phase photon sieve lithographic system also offers new opportunities for high resolution X-ray microscopy and spectroscopy in physical and life sciences.

Paper Details

Date Published: 12 January 2009
PDF: 6 pages
Proc. SPIE 7133, Fifth International Symposium on Instrumentation Science and Technology, 71333U (12 January 2009); doi: 10.1117/12.807078
Show Author Affiliations
Wenbo Jiang, Institute of Optics and Electronics (China)
Graduate School of the Chinese Academy of Sciences (China)
Song Hu, Institute of Optics and Electronics (China)


Published in SPIE Proceedings Vol. 7133:
Fifth International Symposium on Instrumentation Science and Technology

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