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Proceedings Paper

High aspect ratio grating fabrication in SU-8 resist by UV-curing nanoimprint
Author(s): Xudi Wang; Liangjin Ge; Jingjing Lu; Shaojun Fu
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Paper Abstract

UV curing nanoimprint is demonstrated for high aspect ratio gratings fabrication based on SU-8 for nanophotonics and biochemical applications. The defects, which are caused by stress and friction between mold and resist and air bubbles are key issues. To eliminate the defects, the process parameters, such as imprinting pressure, baking time and demolding temperature, are optimized. SU-8 grating with 150nm in width and 1.5µm is presented with good uniformity in large area using Si template fabricated by non-switching DRIE process. The process could find broader applications in the manufacture of biochemical devices and nanophotonic structures.

Paper Details

Date Published: 3 February 2009
PDF: 5 pages
Proc. SPIE 7159, 2008 International Conference on Optical Instruments and Technology: MEMS/NEMS Technology and Applications, 71590K (3 February 2009); doi: 10.1117/12.807006
Show Author Affiliations
Xudi Wang, Hefei Univ. of Technology (China)
Liangjin Ge, Univ. of Science and Technology of China (China)
Jingjing Lu, Hefei Univ. of Technology (China)
Shaojun Fu, Univ. of Science and Technology of China (China)


Published in SPIE Proceedings Vol. 7159:
2008 International Conference on Optical Instruments and Technology: MEMS/NEMS Technology and Applications

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