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Proceedings Paper

Sub-ppm NH3 sensor for control of de-nitrification process using diode laser spectroscopy
Author(s): Haitao Gu; Lipeng Liu; Ying Li; Ren Chen; Luhong Wen; Jian Wang
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Paper Abstract

Diode laser absorption spectroscopy (DLAS) has become an important analytical technique for highly sensitive and specific gas concentration measurements as it is reliable, fast and accurate. In this work a diode laser sensor has been developed to monitor ammonia at sub-ppm in 1510-nm region. The system was designed to control the de-nitrification process with selective catalytic reduction (SCR) abatement system. To ensure that NOx is reacted completely and to avoid secondary pollution resulted from ammonia slip, it is essential to monitor emissions of ammonia for controlling the amount of NH3 injection. NH3 concentration is demanded not to exceed 5ppm, preferably 2-3ppm. In order to provide enough sensitivity, the sensor uses DLAS with wavelength modulation as AC detection of absorption line derivatives, at frequencies where the laser noise is reduced, coupled with coherent electronic detection techniques. Experiment results demonstrate that the sensor with the second-harmonic detection shows in-situ, continuous measurements with low detection limit (60 ppb), fast response (<1s) and long-term stability all of which is difficult to obtain with conventional techniques such as wet chemical analysis, non-dispersive infrared (NDIR). In addition, the influence of water vapor on ammonia measurements due to line broadening effects is investigated. A real-time spectrum analysis algorithm is developed. The systematic measurement error is corrected by means of the line width measurements based on fast pattern correlation analysis of second-harmonic line shape. This offers the advantage of accurate NH3 concentration measurement even though the moisture content is above 40%.

Paper Details

Date Published: 2 February 2009
PDF: 7 pages
Proc. SPIE 7160, 2008 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Applications, 71600Q (2 February 2009); doi: 10.1117/12.806973
Show Author Affiliations
Haitao Gu, Hangzhou Daizi Univ. (China)
Dublin City Univ. (Ireland)
Lipeng Liu, Focused Photonics, Inc. (China)
Ying Li, Focused Photonics, Inc. (China)
Ren Chen, Focused Photonics, Inc. (China)
Luhong Wen, Focused Photonics, Inc. (China)
Jian Wang, Hangzhou Dianzi Univ. (China)

Published in SPIE Proceedings Vol. 7160:
2008 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Applications
Shenghua Ye; Guangjun Zhang; Jun Ni, Editor(s)

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