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Proceedings Paper

Fabrication of the linearly chirped phase mask for working in 248 nm wavelength
Author(s): Quan Liu; Jianhong Wu; Weipeng Yang
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Paper Abstract

Using chirped phase mask to fabricate chirped fiber Bragg gratings (CFBG) is a very important method. In this paper, a linearly chirped phase mask with the period of 1000nm in the center, ruled area 100×10mm2 and 1nm/mm chirp rate has been fabricated by a new technique, which combines holographic-ion beam etching and reactive ion beam etching. This involves two main steps: formation of a grating mask by holographic interference exposure and development, and transferring it into the substrate to form a permanent phase mask by both ion beam etching and reactive ion beam etching. Experimental measurements show that the zero order diffraction efficiency is less than 2% and the plus and minus first-order diffraction efficiency is more than 35%; the nonlinear coefficient is 1.6%. Theoretical analysis also indicates that these phase masks can be used to fabricate the UV written CFBG.

Paper Details

Date Published: 9 February 2009
PDF: 7 pages
Proc. SPIE 7158, 2008 International Conference on Optical Instruments and Technology: Microelectronic and Optoelectronic Devices and Integration, 71580F (9 February 2009); doi: 10.1117/12.806917
Show Author Affiliations
Quan Liu, Soochow Univ. (China)
Jianhong Wu, Soochow Univ. (China)
Weipeng Yang, Soochow Univ. (China)


Published in SPIE Proceedings Vol. 7158:
2008 International Conference on Optical Instruments and Technology: Microelectronic and Optoelectronic Devices and Integration

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