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Proceedings Paper

Spectral calibration method for all-reflected Fourier transform imaging spectrometer
Author(s): Deqi Cui; Ningfang Liao; Ling Ma; Minyong Liang; Yu Lin
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Paper Abstract

All-Reflected Fourier Transform Imaging Spectrometer (ARFTIS) is a novel type of instrument based on Fourier transform spectroscopy. ARFTIS will offer high luminous flux and high spectral resolution, well suited to remote sensing with low energy. But there is nearly not any method of convenient spectrum calibration for this kind of instrument. In this paper, we analyze the spectrum calibration principle of ARFTIS and the cause of the calibration error. We reached the result that the calibration error is getting bigger with the increase of spectrum peak wavelength of the calibration light. By these we develop three convenient spectrum calibration methods used in Visible/Near-Infrared waveband, which are the Monochromatic Method, the Average Method and the Weighted Average Method respectively. We apply these methods to ARFTIS calibrate experiment. According to the experiment results, The Monochromatic Method can calibrate by using only one group of data, but with a little lower calibration precision. However the Weighted Average Method can provide a higher calibration precision than the other two methods. So, the Monochromatic method and the Weighted Average Method both have good application value for ARFTIS calibration.

Paper Details

Date Published: 2 February 2009
PDF: 8 pages
Proc. SPIE 7160, 2008 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Applications, 716022 (2 February 2009); doi: 10.1117/12.806914
Show Author Affiliations
Deqi Cui, Beijing Institute of Technology (China)
Ningfang Liao, Beijing Institute of Technology (China)
Ling Ma, Beijing Institute of Technology (China)
Minyong Liang, Beijing Institute of Technology (China)
Yu Lin, Beijing Institute of Technology (China)

Published in SPIE Proceedings Vol. 7160:
2008 International Conference on Optical Instruments and Technology: Optoelectronic Measurement Technology and Applications
Shenghua Ye; Guangjun Zhang; Jun Ni, Editor(s)

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