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Proceedings Paper

Effects of quick thermal oxidation annealing on structure of vanadium oxide thin films by direct current facing targets reactive magentron sputtering
Author(s): Jiran Liang; Ming Hu; Zhigang Liu
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Paper Abstract

Thermochromism vanadium dioxide thin films were fabricated by quick thermal oxidation annealing of direct current facing targets reactive magnetron sputtered vanadium oxide thin films at 300-360°C for 1-3h. X-ray diffraction shows the vanadium dioxide thin film was obtained annealed at 300°C for 1h, and the structure changed from monoclinic to tetragonal rutile VO2 at around 54°C. X-ray photoelectron spectroscopy and Fourier transform infrared spectroscopy show that the structure of VOx film underwent the following transformation: amorphous structure = VO2 (B) + VO2 (M) - VO2 (M)+VO2 (R).

Paper Details

Date Published: 13 October 2008
PDF: 9 pages
Proc. SPIE 7127, Seventh International Symposium on Instrumentation and Control Technology: Sensors and Instruments, Computer Simulation, and Artificial Intelligence, 712724 (13 October 2008); doi: 10.1117/12.806466
Show Author Affiliations
Jiran Liang, Tianjin Univ. (China)
Ming Hu, Tianjin Univ. (China)
Zhigang Liu, Tianjin Univ. (China)


Published in SPIE Proceedings Vol. 7127:
Seventh International Symposium on Instrumentation and Control Technology: Sensors and Instruments, Computer Simulation, and Artificial Intelligence

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